Since this process is esentially plating in reverse, hopefully someone can provide some info.
The object is to do selective etching on carbon steel, for the purpose of etching logos or lettering in the steel surface. Basically, a photoresist is applied to the steel, exposed to UV through a mask which has the image in positive, the photoresist surface on the steel is then developed and fixed. This leaves the resist with the image in negative on the steel. Etching is accomplished by an etchant and a DC current using a stainless steel cathode, the work is the anode. The etchant is prevented from comtacting any of the steel not exposed as the image.
I've been experimenting useing Dupont ImagOn photopolymer film as the photoresist. For an etchant, I tryied saltwater (which seems to attact the photoresist) and dilute acids. Acetic acid (white vinegar) and dilute hydrochloric acid have been tried. Since the photopolymer is fixed in acetic acid, acids seem to be the appropriate etchants.
Is there a better etchant/electrolyte to use? The object is a deep etch (0.01" or so deep) and a minimum of undercutting. Do to the scale of the image, this setup is in miniature; the exposed surface area is much less than 1" square, the volume of the etchant about 3 oz. and DC currents between 25 and 200 mA with 100% voltage compliance.
Any insight would be appreciated.
The object is to do selective etching on carbon steel, for the purpose of etching logos or lettering in the steel surface. Basically, a photoresist is applied to the steel, exposed to UV through a mask which has the image in positive, the photoresist surface on the steel is then developed and fixed. This leaves the resist with the image in negative on the steel. Etching is accomplished by an etchant and a DC current using a stainless steel cathode, the work is the anode. The etchant is prevented from comtacting any of the steel not exposed as the image.
I've been experimenting useing Dupont ImagOn photopolymer film as the photoresist. For an etchant, I tryied saltwater (which seems to attact the photoresist) and dilute acids. Acetic acid (white vinegar) and dilute hydrochloric acid have been tried. Since the photopolymer is fixed in acetic acid, acids seem to be the appropriate etchants.
Is there a better etchant/electrolyte to use? The object is a deep etch (0.01" or so deep) and a minimum of undercutting. Do to the scale of the image, this setup is in miniature; the exposed surface area is much less than 1" square, the volume of the etchant about 3 oz. and DC currents between 25 and 200 mA with 100% voltage compliance.
Any insight would be appreciated.
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